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- Q1262549 subject Q5637613.
- Q1262549 abstract "Strain engineering refers to a general strategy employed in semiconductor manufacturing to enhance device performance. Performance benefits are achieved by modulating strain in the transistor channel, which enhances electron mobility (or hole mobility) and thereby conductivity through the channel.".
- Q1262549 wikiPageExternalLink page.cfm?ArticleID=RWT123005001504&p=6.
- Q1262549 wikiPageExternalLink bob8.asp.
- Q1262549 wikiPageWikiLink Q108193.
- Q1262549 wikiPageWikiLink Q11456.
- Q1262549 wikiPageWikiLink Q128896.
- Q1262549 wikiPageWikiLink Q133036.
- Q1262549 wikiPageWikiLink Q193514.
- Q1262549 wikiPageWikiLink Q210793.
- Q1262549 wikiPageWikiLink Q248.
- Q1262549 wikiPageWikiLink Q37156.
- Q1262549 wikiPageWikiLink Q5297.
- Q1262549 wikiPageWikiLink Q5339.
- Q1262549 wikiPageWikiLink Q5637613.
- Q1262549 wikiPageWikiLink Q625641.
- Q1262549 wikiPageWikiLink Q6501076.
- Q1262549 wikiPageWikiLink Q772250.
- Q1262549 wikiPageWikiLink Q867.
- Q1262549 comment "Strain engineering refers to a general strategy employed in semiconductor manufacturing to enhance device performance. Performance benefits are achieved by modulating strain in the transistor channel, which enhances electron mobility (or hole mobility) and thereby conductivity through the channel.".
- Q1262549 label "Strain engineering".