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- jjap.41.6852 author1 "Choi, J".
- jjap.41.6852 author2 "Choi, Y".
- jjap.41.6852 author3 "Hong, J".
- jjap.41.6852 author4 "Tian, H".
- jjap.41.6852 author5 "Roh, J.-S".
- jjap.41.6852 author6 "Kim, Y".
- jjap.41.6852 author7 "Chung, T.-M".
- jjap.41.6852 author8 "Woo Oh, Y".
- jjap.41.6852 author9 "Kim, Y".
- jjap.41.6852 displayAuthors "8".
- jjap.41.6852 doi "10.1143/JJAP.41.6852".
- jjap.41.6852 first10 "Chang Gyun".
- jjap.41.6852 first11 "Kwangsoo".
- jjap.41.6852 isCitedBy Chemical_vapor_deposition_of_ruthenium.
- jjap.41.6852 issue "11.0".
- jjap.41.6852 journal "Japanese Journal of Applied Physics".
- jjap.41.6852 last10 "Kim".
- jjap.41.6852 last11 "No".
- jjap.41.6852 pages "6852–6856".
- jjap.41.6852 title "Composition and Electrical Properties of Metallic Ru Thin Films Deposited Using Ru Precursor".
- jjap.41.6852 volume "41".
- jjap.41.6852 year "2002".