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- jjap.36.7552 bibcode "1997JaJAP..36.7552Y".
- jjap.36.7552 doi "10.1143/JJAP.36.7552".
- jjap.36.7552 first1 "Kenji".
- jjap.36.7552 first2 "Kenji".
- jjap.36.7552 first3 "Toru".
- jjap.36.7552 first4 "Hideo".
- jjap.36.7552 first5 "Masao".
- jjap.36.7552 isCitedBy Electron-beam_lithography.
- jjap.36.7552 journal "Japanese Journal of Applied Physics".
- jjap.36.7552 last1 "Yamazaki".
- jjap.36.7552 last2 "Kurihara".
- jjap.36.7552 last3 "Yamaguchi".
- jjap.36.7552 last4 "Namatsu".
- jjap.36.7552 last5 "Nagase".
- jjap.36.7552 page "7552".
- jjap.36.7552 title "Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography".
- jjap.36.7552 volume "36".
- jjap.36.7552 year "1997".