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- 1.571307 date "1982-01-01".
- 1.571307 doi "10.1116/1.571307".
- 1.571307 first "R. P. H.".
- 1.571307 first2 "C. C.".
- 1.571307 first3 "S.".
- 1.571307 isCitedBy Plasma_etching.
- 1.571307 issn "0022-5355".
- 1.571307 issue "1".
- 1.571307 journal "Journal of Vacuum Science & Technology".
- 1.571307 last "Chang".
- 1.571307 last2 "Chang".
- 1.571307 last3 "Darack".
- 1.571307 pages "45–50".
- 1.571307 title "Hydrogen plasma etching of semiconductors and their oxides".
- 1.571307 url "http://scitation.aip.org/content/avs/journal/jvst/20/1/10.1116/1.571307".
- 1.571307 volume "20".