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- 1.116073 bibcode "1996ApPhL..68..322C".
- 1.116073 doi "10.1063/1.116073".
- 1.116073 first1 "D. R. S.".
- 1.116073 first2 "S.".
- 1.116073 first3 "S. P.".
- 1.116073 first4 "J. M. R.".
- 1.116073 isCitedBy Electron-beam_lithography.
- 1.116073 issue "3,) James Watt Nanofabrication Centre".
- 1.116073 journal "Applied Physics Letters".
- 1.116073 last1 "Cumming".
- 1.116073 last2 "Thoms".
- 1.116073 last3 "Beaumont".
- 1.116073 last4 "Weaver".
- 1.116073 page "322".
- 1.116073 title "Fabrication of 3 nm wires using 100 keV electron beam lithography and poly resist".
- 1.116073 volume "68".
- 1.116073 year "1996".