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- Plasma_etcher abstract "A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine-bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process chamber using a system of vacuum pumps. Then a process gas is introduced at low pressure, and is excited into a plasma through dielectric breakdown.".
- Plasma_etcher wikiPageID "8742404".
- Plasma_etcher wikiPageLength "2446".
- Plasma_etcher wikiPageOutDegree "19".
- Plasma_etcher wikiPageRevisionID "648515235".
- Plasma_etcher wikiPageWikiLink Asher_(machine).
- Plasma_etcher wikiPageWikiLink Atmosphere_of_Earth.
- Plasma_etcher wikiPageWikiLink Category:Plasma_processing.
- Plasma_etcher wikiPageWikiLink Category:Semiconductor_device_fabrication.
- Plasma_etcher wikiPageWikiLink Debye_sheath.
- Plasma_etcher wikiPageWikiLink Double_layer_(plasma).
- Plasma_etcher wikiPageWikiLink Electric_field.
- Plasma_etcher wikiPageWikiLink Electrical_breakdown.
- Plasma_etcher wikiPageWikiLink Failure_analysis.
- Plasma_etcher wikiPageWikiLink Fluorine.
- Plasma_etcher wikiPageWikiLink ISM_band.
- Plasma_etcher wikiPageWikiLink List_of_semiconductor_materials.
- Plasma_etcher wikiPageWikiLink Oxygen.
- Plasma_etcher wikiPageWikiLink Photolithography.
- Plasma_etcher wikiPageWikiLink Photoresist.
- Plasma_etcher wikiPageWikiLink Plasma_(physics).
- Plasma_etcher wikiPageWikiLink Semiconductor.
- Plasma_etcher wikiPageWikiLink Silicon_dioxide.
- Plasma_etcher wikiPageWikiLink Wafer_(electronics).
- Plasma_etcher wikiPageWikiLinkText "Plasma etcher".
- Plasma_etcher wikiPageWikiLinkText "plasma etch reactors".
- Plasma_etcher wikiPageWikiLinkText "plasma etching".
- Plasma_etcher wikiPageUsesTemplate Template:Abbrlink.
- Plasma_etcher wikiPageUsesTemplate Template:Reflist.
- Plasma_etcher subject Category:Plasma_processing.
- Plasma_etcher subject Category:Semiconductor_device_fabrication.
- Plasma_etcher hypernym Tool.
- Plasma_etcher type Software.
- Plasma_etcher type Physic.
- Plasma_etcher type Process.
- Plasma_etcher type Redirect.
- Plasma_etcher type Semiconductor.
- Plasma_etcher comment "A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine-bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process chamber using a system of vacuum pumps. Then a process gas is introduced at low pressure, and is excited into a plasma through dielectric breakdown.".
- Plasma_etcher label "Plasma etcher".
- Plasma_etcher sameAs Q7201781.
- Plasma_etcher sameAs تنميش_البلازما.
- Plasma_etcher sameAs Incisore_al_plasma.
- Plasma_etcher sameAs m.027h2n5.
- Plasma_etcher sameAs Q7201781.
- Plasma_etcher wasDerivedFrom Plasma_etcher?oldid=648515235.
- Plasma_etcher isPrimaryTopicOf Plasma_etcher.