Matches in DBpedia 2016-04 for { <http://dbpedia.org/resource/OASIS.MASK> ?p ?o }
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- OASIS.MASK abstract "OASIS.MASK is a standardized language used by computers to represent and express the electronic pattern of an integrated circuit during the engineering, pattern generation and the inspection of semiconductor photomasks.SEMI P44 OASIS.MASK (OASIS.MASK) is a constrained version of SEMI P39 OASIS (OASIS). This constrained version of OASIS emphasizes the data constructs, values and record types that streamline the OASIS reading and writing processes that are unique to the computer systems used in the semiconductor integrated circuit photomask manufacturing flow. The use of OASIS.MASK within the photomask manufacturing flow is optional. OASIS can be used as well.All allowed OASIS record types have been categorized in OASIS.MASK as either Mandatory(M), Allowed(A), Ignored(I), Prohibited(X). Furthermore, the values assigned to each record type must be within a range of values established by the OASIS.MASK standard. OASIS.MASK specifies user-defined PROPERTY records that are not supported in OASIS as \"standard\" PROPERTY record types.".
- OASIS.MASK thumbnail Wikipediaoasismaskexample.png?width=300.
- OASIS.MASK wikiPageExternalLink 2010SPIE.7748E..56M.
- OASIS.MASK wikiPageExternalLink SEMIStandardDetail.aspx?ProductID=1948&DownloadID=1108.
- OASIS.MASK wikiPageExternalLink SEMIStandardDetail.aspx?ProductID=211&DownloadID=1882.
- OASIS.MASK wikiPageExternalLink mentorpaper_52650.pdf.
- OASIS.MASK wikiPageExternalLink mentorpaper_56215.pdf.
- OASIS.MASK wikiPageExternalLink deployment-of-oasis-in-the-semiconductor-industry.
- OASIS.MASK wikiPageExternalLink 12.824351.
- OASIS.MASK wikiPageExternalLink 445-dawn-oasis.html.
- OASIS.MASK wikiPageID "43160222".
- OASIS.MASK wikiPageLength "7216".
- OASIS.MASK wikiPageOutDegree "4".
- OASIS.MASK wikiPageRevisionID "690768718".
- OASIS.MASK wikiPageWikiLink Category:EDA_file_formats.
- OASIS.MASK wikiPageWikiLink Open_Artwork_System_Interchange_Standard.
- OASIS.MASK wikiPageWikiLink Semiconductor_Equipment_and_Materials_International.
- OASIS.MASK wikiPageWikiLink File:Wikipediaoasismaskexample.png.
- OASIS.MASK wikiPageWikiLinkText "OASIS.MASK".
- OASIS.MASK wikiPageUsesTemplate Template:Reflist.
- OASIS.MASK wikiPageUsesTemplate Template:Underlinked.
- OASIS.MASK subject Category:EDA_file_formats.
- OASIS.MASK hypernym Language.
- OASIS.MASK type Language.
- OASIS.MASK comment "OASIS.MASK is a standardized language used by computers to represent and express the electronic pattern of an integrated circuit during the engineering, pattern generation and the inspection of semiconductor photomasks.SEMI P44 OASIS.MASK (OASIS.MASK) is a constrained version of SEMI P39 OASIS (OASIS).".
- OASIS.MASK label "OASIS.MASK".
- OASIS.MASK sameAs m.01118myn.
- OASIS.MASK wasDerivedFrom OASIS.MASK?oldid=690768718.
- OASIS.MASK depiction Wikipediaoasismaskexample.png.
- OASIS.MASK isPrimaryTopicOf OASIS.MASK.