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- Charge_trap_flash abstract "Charge Trap Flash (CTF) is a semiconductor memory technology used in creating non-volatile NOR and NAND flash memory. The technology differs from the more conventional floating-gate MOSFET technology in that it uses a silicon nitride film to store electrons rather than the doped polycrystalline silicon typical of a floating gate structure. This approach allows memory manufacturers to reduce manufacturing costs five ways: Fewer process steps are required to form a charge storage node Smaller process geometries can be used (therefore reducing chip size and cost) Multiple bits can be stored on a single flash memory cell. Improved reliability Higher yield since the charge trap is less susceptible to point defects in the tunnel oxide layerAMD and its partner Fujitsu pioneered the production of charge-trapping flash memory in 2002 with the introduction of the GL NOR flash memory family, and the same business, now operating under the Spansion name, has produced charge trapping devices in high volume since that time. Charge trapping flash accounted for 30% of 2008's $2.5 billion NOR flash market. Saifun Semiconductors, who licensed a large charge trapping technology portfolio to several companies, was acquired by Spansion in March 2008.Although the charge trapping concept has been known since 1967, it wasn't until 2002 that AMD and Fujitsu produced high-volume charge-trapping flash memories.".
- Charge_trap_flash wikiPageExternalLink abs_all.jsp?arnumber=1546329.
- Charge_trap_flash wikiPageExternalLink abs_all.jsp?arnumber=1609340.
- Charge_trap_flash wikiPageExternalLink document.asp?doc_id=1280939.
- Charge_trap_flash wikiPageExternalLink samsung-unwraps-40nm-charge-trap-flash-device.html.
- Charge_trap_flash wikiPageID "6973208".
- Charge_trap_flash wikiPageLength "24025".
- Charge_trap_flash wikiPageOutDegree "29".
- Charge_trap_flash wikiPageRevisionID "700627250".
- Charge_trap_flash wikiPageWikiLink Advanced_Micro_Devices.
- Charge_trap_flash wikiPageWikiLink Category:Non-volatile_memory.
- Charge_trap_flash wikiPageWikiLink EEPROM.
- Charge_trap_flash wikiPageWikiLink EPROM.
- Charge_trap_flash wikiPageWikiLink Field_electron_emission.
- Charge_trap_flash wikiPageWikiLink Flash_memory.
- Charge_trap_flash wikiPageWikiLink Floating-gate_MOSFET.
- Charge_trap_flash wikiPageWikiLink Freescale_Semiconductor.
- Charge_trap_flash wikiPageWikiLink Fujitsu.
- Charge_trap_flash wikiPageWikiLink High-κ_dielectric.
- Charge_trap_flash wikiPageWikiLink Hot-carrier_injection.
- Charge_trap_flash wikiPageWikiLink Intel.
- Charge_trap_flash wikiPageWikiLink International_Technology_Roadmap_for_Semiconductors.
- Charge_trap_flash wikiPageWikiLink Microcontroller.
- Charge_trap_flash wikiPageWikiLink Multi-level_cell.
- Charge_trap_flash wikiPageWikiLink Nanocrystal.
- Charge_trap_flash wikiPageWikiLink SONOS.
- Charge_trap_flash wikiPageWikiLink Samsung_Electronics.
- Charge_trap_flash wikiPageWikiLink Spansion.
- Charge_trap_flash wikiPageWikiLink File:Fig_1_-_MirrorBit.jpg.
- Charge_trap_flash wikiPageWikiLink File:Fig_2_-_Hot_Electron_Programming.JPG.
- Charge_trap_flash wikiPageWikiLink File:Fig_3_-_Hot_Hole_Erase.JPG.
- Charge_trap_flash wikiPageWikiLink File:Fig_4_-_Process_History.JPG.
- Charge_trap_flash wikiPageWikiLink File:Fig_5_-_Capped_Cells.JPG.
- Charge_trap_flash wikiPageWikiLink File:Fig_6_-_BiCS.JPG.
- Charge_trap_flash wikiPageWikiLinkText "Charge trap flash".
- Charge_trap_flash wikiPageWikiLinkText "charge trap flash".
- Charge_trap_flash wikiPageWikiLinkText "insulator "traps"".
- Charge_trap_flash wikiPageUsesTemplate Template:Reflist.
- Charge_trap_flash subject Category:Non-volatile_memory.
- Charge_trap_flash hypernym Technology.
- Charge_trap_flash type Company.
- Charge_trap_flash type Redirect.
- Charge_trap_flash comment "Charge Trap Flash (CTF) is a semiconductor memory technology used in creating non-volatile NOR and NAND flash memory. The technology differs from the more conventional floating-gate MOSFET technology in that it uses a silicon nitride film to store electrons rather than the doped polycrystalline silicon typical of a floating gate structure.".
- Charge_trap_flash label "Charge trap flash".
- Charge_trap_flash sameAs Q4036055.
- Charge_trap_flash sameAs Charge-Trapping-Speicher.
- Charge_trap_flash sameAs m.0gzdxs.
- Charge_trap_flash sameAs Charge_Trap_Flash.
- Charge_trap_flash sameAs Q4036055.
- Charge_trap_flash wasDerivedFrom Charge_trap_flash?oldid=700627250.
- Charge_trap_flash isPrimaryTopicOf Charge_trap_flash.