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• Capacitively_coupled_plasma abstract "A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric. A typical CCP system is driven by a single radio-frequency (RF) power supply, typically at 13.56 MHz. One of two electrodes is connected to the power supply, and the other one is grounded. As this configuration is similar in principle to a capacitor in an electric circuit, the plasma formed in this configuration is called a capacitively coupled plasma. When an electric field is generated between electrodes, atoms are ionized and release electrons. The electrons in the gas are accelerated by the RF field and can ionize the gas directly or indirectly by collisions, producing secondary electrons. When the electric field is strong enough, it can lead to what is known as electron avalanche. After avalanche breakdown, the gas becomes electrically conductive due to abundant free electrons. Often it accompanies light emission from excited atoms or molecules in the gas. When visible light is produced, plasma generation can be indirectly observed even with bare eyes.A variation on capacitively coupled plasma involves isolating one of the electrodes, usually with a capacitor. The capacitor appears like a short circuit to the high frequency RF field, but like an open circuit to DC field. Electrons impinge on the electrode in the sheath, and the electrode quickly acquires a negative charge (or self-bias) because the capacitor does not allow it to discharge to ground. This sets up a secondary, DC field across the plasma in addition to the AC field. Massive ions are unable to react to the quickly changing AC field, but the strong, persistent DC field accelerates them toward the self-biased electrode. These energetic ions are exploited in many microfabrication processes (see RIE) by placing a substrate on the isolated (self-biased) electrode.CCPs have wide applications in the semiconductor processing industry for thin film deposition (see sputtering, PECVD) and etching.".
• Capacitively_coupled_plasma wikiPageID "3216500".
• Capacitively_coupled_plasma wikiPageLength "3008".
• Capacitively_coupled_plasma wikiPageOutDegree "35".
• Capacitively_coupled_plasma wikiPageRevisionID "576604786".
• Capacitively_coupled_plasma wikiPageWikiLink Alternating_current.
• Capacitively_coupled_plasma wikiPageWikiLink Atmosphere_(unit).
• Capacitively_coupled_plasma wikiPageWikiLink Avalanche_breakdown.
• Capacitively_coupled_plasma wikiPageWikiLink Capacitor.
• Capacitively_coupled_plasma wikiPageWikiLink Category:Electronics_manufacturing.
• Capacitively_coupled_plasma wikiPageWikiLink Category:Plasma_physics.
• Capacitively_coupled_plasma wikiPageWikiLink Collision.
• Capacitively_coupled_plasma wikiPageWikiLink Debye_sheath.
• Capacitively_coupled_plasma wikiPageWikiLink Direct_current.
• Capacitively_coupled_plasma wikiPageWikiLink Electric_field.
• Capacitively_coupled_plasma wikiPageWikiLink Electrical_conductor.
• Capacitively_coupled_plasma wikiPageWikiLink Electrode.
• Capacitively_coupled_plasma wikiPageWikiLink Electron.
• Capacitively_coupled_plasma wikiPageWikiLink Electron_avalanche.
• Capacitively_coupled_plasma wikiPageWikiLink Etching_(microfabrication).
• Capacitively_coupled_plasma wikiPageWikiLink Ground_(electricity).
• Capacitively_coupled_plasma wikiPageWikiLink ISM_band.
• Capacitively_coupled_plasma wikiPageWikiLink Inductively_coupled_plasma.
• Capacitively_coupled_plasma wikiPageWikiLink Ion.
• Capacitively_coupled_plasma wikiPageWikiLink List_of_plasma_(physics)_articles.
• Capacitively_coupled_plasma wikiPageWikiLink Microfabrication.
• Capacitively_coupled_plasma wikiPageWikiLink Multipactor_effect.
• Capacitively_coupled_plasma wikiPageWikiLink Open-circuit_voltage.
• Capacitively_coupled_plasma wikiPageWikiLink Plasma-enhanced_chemical_vapor_deposition.
• Capacitively_coupled_plasma wikiPageWikiLink Plasma_(physics).
• Capacitively_coupled_plasma wikiPageWikiLink Plasma_etching.
• Capacitively_coupled_plasma wikiPageWikiLink Radio_frequency.
• Capacitively_coupled_plasma wikiPageWikiLink Reactive-ion_etching.
• Capacitively_coupled_plasma wikiPageWikiLink Secondary_electrons.
• Capacitively_coupled_plasma wikiPageWikiLink Short_circuit.
• Capacitively_coupled_plasma wikiPageWikiLink Sputtering.
• Capacitively_coupled_plasma wikiPageWikiLink Thin_film.
• Capacitively_coupled_plasma wikiPageWikiLinkText "Capacitively coupled plasma".
• Capacitively_coupled_plasma wikiPageWikiLinkText "capacitive discharge".
• Capacitively_coupled_plasma wikiPageWikiLinkText "capacitively coupled plasma".
• Capacitively_coupled_plasma wikiPageUsesTemplate Template:Refimprove.
• Capacitively_coupled_plasma subject Category:Electronics_manufacturing.
• Capacitively_coupled_plasma subject Category:Plasma_physics.
• Capacitively_coupled_plasma type Astrophysic.
• Capacitively_coupled_plasma type Physic.
• Capacitively_coupled_plasma comment "A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric. A typical CCP system is driven by a single radio-frequency (RF) power supply, typically at 13.56 MHz. One of two electrodes is connected to the power supply, and the other one is grounded.".
• Capacitively_coupled_plasma label "Capacitively coupled plasma".
• Capacitively_coupled_plasma sameAs Q5034482.
• Capacitively_coupled_plasma sameAs 容量結合プラズマ.
• Capacitively_coupled_plasma sameAs m.08zz9f.
• Capacitively_coupled_plasma sameAs Q5034482.
• Capacitively_coupled_plasma wasDerivedFrom Capacitively_coupled_plasma?oldid=576604786.
• Capacitively_coupled_plasma isPrimaryTopicOf Capacitively_coupled_plasma.