Matches in DBpedia 2016-04 for { <http://citation.dbpedia.org/hash/7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06> ?p ?o }
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- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 date "2005-10-31".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 first1 "Junghoon".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 first2 "Yan".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 first3 "John C.".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 first4 "Mark A.".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 isCitedBy Deep_reactive-ion_etching.
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 journal "J. Vac. Sci. Technol. B".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 last1 "Yeom".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 last2 "Wu".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 last3 "Selby".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 last4 "Shannon".
- 7c60d35b09a8da1ce39559048e814a675ca952dd30b096151a5968863b47ea06 title "Maximum achievable aspect ratio in deep reactive ion etching of silicon due to aspect ratio dependent transport and the microloading effect".