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- Reactive-ion_etching abstract "Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.".
- Reactive-ion_etching thumbnail Reactive_Ion_Etcher.JPG?width=300.
- Reactive-ion_etching wikiPageExternalLink rie.html.
- Reactive-ion_etching wikiPageExternalLink plasmaetchfundam.html.
- Reactive-ion_etching wikiPageExternalLink rie_etching.phtml.
- Reactive-ion_etching wikiPageExternalLink sibo_1.htm.
- Reactive-ion_etching wikiPageExternalLink reactive-ion-etching-systems-rie.php.
- Reactive-ion_etching wikiPageID "751638".
- Reactive-ion_etching wikiPageLength "4821".
- Reactive-ion_etching wikiPageOutDegree "36".
- Reactive-ion_etching wikiPageRevisionID "675439805".
- Reactive-ion_etching wikiPageWikiLink Anisotropic.
- Reactive-ion_etching wikiPageWikiLink Anisotropy.
- Reactive-ion_etching wikiPageWikiLink Category:Etching_(microfabrication).
- Reactive-ion_etching wikiPageWikiLink Category:Plasma_processing.
- Reactive-ion_etching wikiPageWikiLink Category:Semiconductor_device_fabrication.
- Reactive-ion_etching wikiPageWikiLink Chemical_milling.
- Reactive-ion_etching wikiPageWikiLink Chemical_reaction.
- Reactive-ion_etching wikiPageWikiLink Deep_reactive-ion_etching.
- Reactive-ion_etching wikiPageWikiLink Dry_etching.
- Reactive-ion_etching wikiPageWikiLink Electromagnetic_field.
- Reactive-ion_etching wikiPageWikiLink Etching_(microfabrication).
- Reactive-ion_etching wikiPageWikiLink Hertz.
- Reactive-ion_etching wikiPageWikiLink ISM_band.
- Reactive-ion_etching wikiPageWikiLink Inductively_coupled_plasma.
- Reactive-ion_etching wikiPageWikiLink Ion.
- Reactive-ion_etching wikiPageWikiLink Isotropic.
- Reactive-ion_etching wikiPageWikiLink Isotropic_etching.
- Reactive-ion_etching wikiPageWikiLink Isotropy.
- Reactive-ion_etching wikiPageWikiLink Kinetic_energy.
- Reactive-ion_etching wikiPageWikiLink Megahertz.
- Reactive-ion_etching wikiPageWikiLink Microfabrication.
- Reactive-ion_etching wikiPageWikiLink Plasma_(physics).
- Reactive-ion_etching wikiPageWikiLink Plasma_etcher.
- Reactive-ion_etching wikiPageWikiLink Pressure.
- Reactive-ion_etching wikiPageWikiLink Radio_frequency.
- Reactive-ion_etching wikiPageWikiLink Silicon.
- Reactive-ion_etching wikiPageWikiLink Sputter.
- Reactive-ion_etching wikiPageWikiLink Sputtering.
- Reactive-ion_etching wikiPageWikiLink Sulfur_hexafluoride.
- Reactive-ion_etching wikiPageWikiLink Torr.
- Reactive-ion_etching wikiPageWikiLink Vacuum.
- Reactive-ion_etching wikiPageWikiLink Vacuum_pump.
- Reactive-ion_etching wikiPageWikiLink Wafer_(electronics).
- Reactive-ion_etching wikiPageWikiLink Watt.
- Reactive-ion_etching wikiPageWikiLink File:Reactive_Ion_Etcher.JPG.
- Reactive-ion_etching wikiPageWikiLink File:Rieoperation.svg.
- Reactive-ion_etching wikiPageWikiLinkText "ICP-RIE".
- Reactive-ion_etching wikiPageWikiLinkText "RIE (Reactive Ion Etching)".
- Reactive-ion_etching wikiPageWikiLinkText "RIE".
- Reactive-ion_etching wikiPageWikiLinkText "Reactive Ion Etching".
- Reactive-ion_etching wikiPageWikiLinkText "Reactive-ion etching".
- Reactive-ion_etching wikiPageWikiLinkText "etch system".
- Reactive-ion_etching wikiPageWikiLinkText "ion bombardment".
- Reactive-ion_etching wikiPageWikiLinkText "reactive ion etching".
- Reactive-ion_etching wikiPageWikiLinkText "reactive-ion etching".
- Reactive-ion_etching hasPhotoCollection Reactive-ion_etching.
- Reactive-ion_etching subject Category:Etching_(microfabrication).
- Reactive-ion_etching subject Category:Plasma_processing.
- Reactive-ion_etching subject Category:Semiconductor_device_fabrication.
- Reactive-ion_etching hypernym Technology.
- Reactive-ion_etching type Company.
- Reactive-ion_etching type Physic.
- Reactive-ion_etching type Process.
- Reactive-ion_etching type Semiconductor.
- Reactive-ion_etching comment "Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.".
- Reactive-ion_etching label "Reactive-ion etching".
- Reactive-ion_etching sameAs سونش_پلاسما.
- Reactive-ion_etching sameAs ICP-RIE.
- Reactive-ion_etching sameAs Gravure_ionique_réactive.
- Reactive-ion_etching sameAs 反応性イオンエッチング.
- Reactive-ion_etching sameAs m.03895x.
- Reactive-ion_etching sameAs Реактивное_ионное_травление.
- Reactive-ion_etching sameAs Q1640159.
- Reactive-ion_etching sameAs Q1640159.
- Reactive-ion_etching sameAs 反应离子刻蚀.
- Reactive-ion_etching wasDerivedFrom Reactive-ion_etching?oldid=675439805.
- Reactive-ion_etching depiction Reactive_Ion_Etcher.JPG.
- Reactive-ion_etching isPrimaryTopicOf Reactive-ion_etching.