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- Chemical_beam_epitaxy abstract "Chemical beam epitaxy (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III-V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular beams of reactive gases, typically as the hydride or a metalorganic. The term CBE is often used interchangeably with metal-organic molecular beam epitaxy (MOMBE). The nomenclature does differentiate between the two (slightly different) processes, however. When used in the strictest sense, CBE refers to the technique in which both components are obtained from gaseous sources, while MOMBE refers to the technique in which the group III component is obtained from a gaseous source and the group V component from a solid source.".
- Chemical_beam_epitaxy thumbnail CBE_im1.png?width=300.
- Chemical_beam_epitaxy wikiPageID "3593867".
- Chemical_beam_epitaxy wikiPageLength "11279".
- Chemical_beam_epitaxy wikiPageOutDegree "37".
- Chemical_beam_epitaxy wikiPageRevisionID "551407748".
- Chemical_beam_epitaxy wikiPageWikiLink Adsorbtion.
- Chemical_beam_epitaxy wikiPageWikiLink Adsorption.
- Chemical_beam_epitaxy wikiPageWikiLink Alkyls.
- Chemical_beam_epitaxy wikiPageWikiLink Aluminium.
- Chemical_beam_epitaxy wikiPageWikiLink Arsenic.
- Chemical_beam_epitaxy wikiPageWikiLink Carbon.
- Chemical_beam_epitaxy wikiPageWikiLink Category:Semiconductor_growth.
- Chemical_beam_epitaxy wikiPageWikiLink Category:Thin_film_deposition.
- Chemical_beam_epitaxy wikiPageWikiLink Chemical_Vapor_Deposition.
- Chemical_beam_epitaxy wikiPageWikiLink Chemical_kinetics.
- Chemical_beam_epitaxy wikiPageWikiLink Chemical_vapor_deposition.
- Chemical_beam_epitaxy wikiPageWikiLink Compound_semiconductor.
- Chemical_beam_epitaxy wikiPageWikiLink Crystal.
- Chemical_beam_epitaxy wikiPageWikiLink Crystal_structure.
- Chemical_beam_epitaxy wikiPageWikiLink Epitaxy.
- Chemical_beam_epitaxy wikiPageWikiLink Evaporation.
- Chemical_beam_epitaxy wikiPageWikiLink File:CBE_im1.png.
- Chemical_beam_epitaxy wikiPageWikiLink File:CBE_im2.png.
- Chemical_beam_epitaxy wikiPageWikiLink Gallium.
- Chemical_beam_epitaxy wikiPageWikiLink Group_3_element.
- Chemical_beam_epitaxy wikiPageWikiLink Group_5_element.
- Chemical_beam_epitaxy wikiPageWikiLink Group_III_elements.
- Chemical_beam_epitaxy wikiPageWikiLink Group_V_elements.
- Chemical_beam_epitaxy wikiPageWikiLink Hydride.
- Chemical_beam_epitaxy wikiPageWikiLink Liquid_nitrogen.
- Chemical_beam_epitaxy wikiPageWikiLink MOVPE.
- Chemical_beam_epitaxy wikiPageWikiLink Metalorganic.
- Chemical_beam_epitaxy wikiPageWikiLink Metalorganic_vapour_phase_epitaxy.
- Chemical_beam_epitaxy wikiPageWikiLink Metalorganics.
- Chemical_beam_epitaxy wikiPageWikiLink Molecular_beam_epitaxy.
- Chemical_beam_epitaxy wikiPageWikiLink Molybdenum.
- Chemical_beam_epitaxy wikiPageWikiLink Phosphorus.
- Chemical_beam_epitaxy wikiPageWikiLink Pyrolysis.
- Chemical_beam_epitaxy wikiPageWikiLink RHEED.
- Chemical_beam_epitaxy wikiPageWikiLink Reflection_high-energy_electron_diffraction.
- Chemical_beam_epitaxy wikiPageWikiLink Semiconductor_device_fabrication.
- Chemical_beam_epitaxy wikiPageWikiLink Tantalum.
- Chemical_beam_epitaxy wikiPageWikiLink Thermal_energy.
- Chemical_beam_epitaxy wikiPageWikiLink Thin-film_deposition.
- Chemical_beam_epitaxy wikiPageWikiLink Thin_film.
- Chemical_beam_epitaxy wikiPageWikiLink Torr.
- Chemical_beam_epitaxy wikiPageWikiLink Transistor.
- Chemical_beam_epitaxy wikiPageWikiLink Vacuum.
- Chemical_beam_epitaxy wikiPageWikiLink Viscosity.
- Chemical_beam_epitaxy wikiPageWikiLinkText "Chemical beam epitaxy".
- Chemical_beam_epitaxy wikiPageWikiLinkText "chemical beam epitaxy".
- Chemical_beam_epitaxy wikiPageWikiLinkText "gas-source MBE".
- Chemical_beam_epitaxy hasPhotoCollection Chemical_beam_epitaxy.
- Chemical_beam_epitaxy wikiPageUsesTemplate Template:Reflist.
- Chemical_beam_epitaxy subject Category:Semiconductor_growth.
- Chemical_beam_epitaxy subject Category:Thin_film_deposition.
- Chemical_beam_epitaxy type Film.
- Chemical_beam_epitaxy type Coating.
- Chemical_beam_epitaxy type Film.
- Chemical_beam_epitaxy type Process.
- Chemical_beam_epitaxy comment "Chemical beam epitaxy (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III-V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular beams of reactive gases, typically as the hydride or a metalorganic. The term CBE is often used interchangeably with metal-organic molecular beam epitaxy (MOMBE).".
- Chemical_beam_epitaxy label "Chemical beam epitaxy".
- Chemical_beam_epitaxy sameAs Chemische_bundelepitaxie.
- Chemical_beam_epitaxy sameAs m.09nn8g.
- Chemical_beam_epitaxy sameAs Q5090443.
- Chemical_beam_epitaxy sameAs Q5090443.
- Chemical_beam_epitaxy wasDerivedFrom Chemical_beam_epitaxy?oldid=551407748.
- Chemical_beam_epitaxy depiction CBE_im1.png.
- Chemical_beam_epitaxy isPrimaryTopicOf Chemical_beam_epitaxy.