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- Q7031672 subject Q7465670.
- Q7031672 abstract "The Niemeyer–Dolan technique, also called the Dolan technique or the shadow evaporation technique, is a thin-film lithographic method to create nanometer-sized overlapping structures.This technique uses an evaporation mask that is suspended above the substrate (see figure). The evaporation mask can be formed from two layers of resist. Depending on the evaporation angle, the shadow image of the mask is projected onto different positions on the substrate. By carefully choosing the angle for each material to be deposited, adjacent openings in the mask can be projected on the same spot, creating an overlay of two thin films with a well-defined geometry.".
- Q7031672 thumbnail TyNiemeyerDolanTechnique.png?width=300.
- Q7031672 wikiPageWikiLink Q1093894.
- Q7031672 wikiPageWikiLink Q1133068.
- Q7031672 wikiPageWikiLink Q11349590.
- Q7031672 wikiPageWikiLink Q1137203.
- Q7031672 wikiPageWikiLink Q11650.
- Q7031672 wikiPageWikiLink Q133036.
- Q7031672 wikiPageWikiLink Q1570182.
- Q7031672 wikiPageWikiLink Q178674.
- Q7031672 wikiPageWikiLink Q3183536.
- Q7031672 wikiPageWikiLink Q7465670.
- Q7031672 comment "The Niemeyer–Dolan technique, also called the Dolan technique or the shadow evaporation technique, is a thin-film lithographic method to create nanometer-sized overlapping structures.This technique uses an evaporation mask that is suspended above the substrate (see figure). The evaporation mask can be formed from two layers of resist. Depending on the evaporation angle, the shadow image of the mask is projected onto different positions on the substrate.".
- Q7031672 label "Niemeyer–Dolan technique".
- Q7031672 depiction TyNiemeyerDolanTechnique.png.