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- Q1903370 subject Q8728768.
- Q1903370 abstract "The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America. It involves the following chemical processes performed in sequence: Removal of the organic contaminants (organic clean + particle clean) Removal of thin oxide layer (oxide strip, optional) Removal of ionic contamination (ionic clean)↑ ↑ ↑".
- Q1903370 wikiPageExternalLink rcaClean.html.
- Q1903370 wikiPageWikiLink Q1069404.
- Q1903370 wikiPageWikiLink Q11456.
- Q1903370 wikiPageWikiLink Q116269.
- Q1903370 wikiPageWikiLink Q1422588.
- Q1903370 wikiPageWikiLink Q1478788.
- Q1903370 wikiPageWikiLink Q14982.
- Q1903370 wikiPageWikiLink Q163214.
- Q1903370 wikiPageWikiLink Q171877.
- Q1903370 wikiPageWikiLink Q196823.
- Q1903370 wikiPageWikiLink Q2122463.
- Q1903370 wikiPageWikiLink Q218038.
- Q1903370 wikiPageWikiLink Q2409.
- Q1903370 wikiPageWikiLink Q2552875.
- Q1903370 wikiPageWikiLink Q267131.
- Q1903370 wikiPageWikiLink Q407936.
- Q1903370 wikiPageWikiLink Q421888.
- Q1903370 wikiPageWikiLink Q49546.
- Q1903370 wikiPageWikiLink Q505668.
- Q1903370 wikiPageWikiLink Q50690.
- Q1903370 wikiPageWikiLink Q677.
- Q1903370 wikiPageWikiLink Q82682.
- Q1903370 wikiPageWikiLink Q8728768.
- Q1903370 wikiPageWikiLink Q899068.
- Q1903370 comment "The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.".
- Q1903370 label "RCA clean".