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- Q1076175 subject Q6348244.
- Q1076175 abstract "Immersion lithography is a photolithography resolution enhancement technique for manufacturing integrated circuits (ICs) that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal to the refractive index of the liquid. Current immersion lithography tools use highly purified water for this liquid, achieving feature sizes below 45 nanometers. ASML, Canon, and Nikon are currently the only manufacturers of immersion lithography systems.The idea for Immersion lithography was first proposed and realized in the 1980s.".
- Q1076175 thumbnail Immersion_lithography_illustration.svg?width=300.
- Q1076175 wikiPageWikiLink Q11391.
- Q1076175 wikiPageWikiLink Q11473.
- Q1076175 wikiPageWikiLink Q1218180.
- Q1076175 wikiPageWikiLink Q128896.
- Q1076175 wikiPageWikiLink Q143616.
- Q1076175 wikiPageWikiLink Q1439684.
- Q1076175 wikiPageWikiLink Q174102.
- Q1076175 wikiPageWikiLink Q1917460.
- Q1076175 wikiPageWikiLink Q193412.
- Q1076175 wikiPageWikiLink Q248.
- Q1076175 wikiPageWikiLink Q2652244.
- Q1076175 wikiPageWikiLink Q2652372.
- Q1076175 wikiPageWikiLink Q2750603.
- Q1076175 wikiPageWikiLink Q297879.
- Q1076175 wikiPageWikiLink Q37156.
- Q1076175 wikiPageWikiLink Q371965.
- Q1076175 wikiPageWikiLink Q425710.
- Q1076175 wikiPageWikiLink Q49125.
- Q1076175 wikiPageWikiLink Q622938.
- Q1076175 wikiPageWikiLink Q62621.
- Q1076175 wikiPageWikiLink Q6348244.
- Q1076175 wikiPageWikiLink Q740898.
- Q1076175 wikiPageWikiLink Q869122.
- Q1076175 wikiPageWikiLink Q898896.
- Q1076175 wikiPageWikiLink Q901106.
- Q1076175 comment "Immersion lithography is a photolithography resolution enhancement technique for manufacturing integrated circuits (ICs) that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal to the refractive index of the liquid. Current immersion lithography tools use highly purified water for this liquid, achieving feature sizes below 45 nanometers.".
- Q1076175 label "Immersion lithography".
- Q1076175 depiction Immersion_lithography_illustration.svg.