Matches in DBpedia 2016-04 for { <http://dbpedia.org/resource/Spacer_patterning> ?p ?o }
Showing triples 1 to 28 of
28
with 100 triples per page.
- Spacer_patterning abstract "Spacer patterning is a technique employed for patterning features with linewidths smaller than can be achieved by conventional lithography. In the most general sense, the spacer is a layer that is deposited over a pre-patterned feature, often called the mandrel. The spacer is subsequently etched back so that the spacer portion covering the mandrel is etched away while the spacer portion on the sidewall remains. The mandrel may then be removed, leaving two spacers (one for each edge) for each mandrel. The spacers may be further trimmed to narrower widths, especially to act as mandrels for a subsequent 2nd spacer formation. Hence this is a readily practiced form of multiple patterning. Alternatively, one of the two spacers may be removed and the remaining one trimmed to a much smaller final linewidth. Whereas immersion lithography has a resolution of ~40 nm lines and spaces, spacer patterning may be applied to attain 20 nm. This resolution improvement technique is also known as Self-Aligned Double Patterning (SADP). SADP may be re-applied for even higher resolution, and has already been demonstrated for 15 nm NAND flash memory. Spacer patterning has also been adopted for sub-20 nm logic nodes, e.g., 14 nm and 10 nm.".
- Spacer_patterning thumbnail Spacer_Patterning.JPG?width=300.
- Spacer_patterning wikiPageID "49040767".
- Spacer_patterning wikiPageLength "3530".
- Spacer_patterning wikiPageOutDegree "12".
- Spacer_patterning wikiPageRevisionID "699143820".
- Spacer_patterning wikiPageWikiLink 10_nanometres.
- Spacer_patterning wikiPageWikiLink 14_nanometer.
- Spacer_patterning wikiPageWikiLink Category:Lithography_(microfabrication).
- Spacer_patterning wikiPageWikiLink File:Spacer_trimming.png.
- Spacer_patterning wikiPageWikiLink Flash_memory.
- Spacer_patterning wikiPageWikiLink Gate_oxide.
- Spacer_patterning wikiPageWikiLink Immersion_lithography.
- Spacer_patterning wikiPageWikiLink Lithography.
- Spacer_patterning wikiPageWikiLink MOSFET.
- Spacer_patterning wikiPageWikiLink Multiple_patterning.
- Spacer_patterning wikiPageWikiLink Silicon_nitride.
- Spacer_patterning wikiPageWikiLink File:Spacer_Patterning.JPG.
- Spacer_patterning wikiPageWikiLinkText "spacer patterning".
- Spacer_patterning wikiPageUsesTemplate Template:Reflist.
- Spacer_patterning subject Category:Lithography_(microfabrication).
- Spacer_patterning hypernym Technique.
- Spacer_patterning type TopicalConcept.
- Spacer_patterning comment "Spacer patterning is a technique employed for patterning features with linewidths smaller than can be achieved by conventional lithography. In the most general sense, the spacer is a layer that is deposited over a pre-patterned feature, often called the mandrel. The spacer is subsequently etched back so that the spacer portion covering the mandrel is etched away while the spacer portion on the sidewall remains.".
- Spacer_patterning label "Spacer patterning".
- Spacer_patterning wasDerivedFrom Spacer_patterning?oldid=699143820.
- Spacer_patterning depiction Spacer_Patterning.JPG.
- Spacer_patterning isPrimaryTopicOf Spacer_patterning.