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- RCA_clean abstract "The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America. It involves the following chemical processes performed in sequence: Removal of the organic contaminants (organic clean + particle clean) Removal of thin oxide layer (oxide strip, optional) Removal of ionic contamination (ionic clean)↑ ↑ ↑".
- RCA_clean wikiPageExternalLink rcaClean.html.
- RCA_clean wikiPageID "7128334".
- RCA_clean wikiPageLength "5607".
- RCA_clean wikiPageOutDegree "26".
- RCA_clean wikiPageRevisionID "707909202".
- RCA_clean wikiPageWikiLink Acetone.
- RCA_clean wikiPageWikiLink Ammonium_hydroxide.
- RCA_clean wikiPageWikiLink Borosilicate_glass.
- RCA_clean wikiPageWikiLink Category:Semiconductor_device_fabrication.
- RCA_clean wikiPageWikiLink Chemical-mechanical_planarization.
- RCA_clean wikiPageWikiLink Chemical_vapor_deposition.
- RCA_clean wikiPageWikiLink Diffusion.
- RCA_clean wikiPageWikiLink Fused_quartz.
- RCA_clean wikiPageWikiLink Hydrochloric_acid.
- RCA_clean wikiPageWikiLink Hydrogen_peroxide.
- RCA_clean wikiPageWikiLink Iron.
- RCA_clean wikiPageWikiLink Methanol.
- RCA_clean wikiPageWikiLink Oxide.
- RCA_clean wikiPageWikiLink Piranha_solution.
- RCA_clean wikiPageWikiLink Purified_water.
- RCA_clean wikiPageWikiLink RCA.
- RCA_clean wikiPageWikiLink Redox.
- RCA_clean wikiPageWikiLink Semiconductor.
- RCA_clean wikiPageWikiLink Silicon_dioxide.
- RCA_clean wikiPageWikiLink Silicon_on_insulator.
- RCA_clean wikiPageWikiLink Trichloroethylene.
- RCA_clean wikiPageWikiLink Wafer_(electronics).
- RCA_clean wikiPageWikiLink Zeta_potential.
- RCA_clean wikiPageWikiLinkText "RCA clean".
- RCA_clean wikiPageWikiLinkText "RCA-1 clean".
- RCA_clean wikiPageWikiLinkText "cleaned".
- RCA_clean subject Category:Semiconductor_device_fabrication.
- RCA_clean hypernym Set.
- RCA_clean type Process.
- RCA_clean type Semiconductor.
- RCA_clean comment "The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.".
- RCA_clean label "RCA clean".
- RCA_clean sameAs Q1903370.
- RCA_clean sameAs RCA-Reinigung.
- RCA_clean sameAs RCA-reiniging.
- RCA_clean sameAs m.0h5mxq.
- RCA_clean sameAs Q1903370.
- RCA_clean wasDerivedFrom RCA_clean?oldid=707909202.
- RCA_clean isPrimaryTopicOf RCA_clean.