Matches in DBpedia 2016-04 for { <http://dbpedia.org/resource/Niemeyer–Dolan_technique> ?p ?o }
Showing triples 1 to 29 of
29
with 100 triples per page.
- Niemeyer–Dolan_technique abstract "The Niemeyer–Dolan technique, also called the Dolan technique or the shadow evaporation technique, is a thin-film lithographic method to create nanometer-sized overlapping structures.This technique uses an evaporation mask that is suspended above the substrate (see figure). The evaporation mask can be formed from two layers of resist. Depending on the evaporation angle, the shadow image of the mask is projected onto different positions on the substrate. By carefully choosing the angle for each material to be deposited, adjacent openings in the mask can be projected on the same spot, creating an overlay of two thin films with a well-defined geometry.".
- Niemeyer–Dolan_technique thumbnail TyNiemeyerDolanTechnique.png?width=300.
- Niemeyer–Dolan_technique wikiPageID "4294270".
- Niemeyer–Dolan_technique wikiPageLength "1648".
- Niemeyer–Dolan_technique wikiPageOutDegree "12".
- Niemeyer–Dolan_technique wikiPageRevisionID "683767378".
- Niemeyer–Dolan_technique wikiPageWikiLink Category:Nanoelectronics.
- Niemeyer–Dolan_technique wikiPageWikiLink Coating.
- Niemeyer–Dolan_technique wikiPageWikiLink Electronics.
- Niemeyer–Dolan_technique wikiPageWikiLink Lithography.
- Niemeyer–Dolan_technique wikiPageWikiLink Nanometre.
- Niemeyer–Dolan_technique wikiPageWikiLink Nanostructure.
- Niemeyer–Dolan_technique wikiPageWikiLink Quantum_dot.
- Niemeyer–Dolan_technique wikiPageWikiLink Resist.
- Niemeyer–Dolan_technique wikiPageWikiLink Thin_film.
- Niemeyer–Dolan_technique wikiPageWikiLink Tunnel_junction.
- Niemeyer–Dolan_technique wikiPageWikiLink File:TyNiemeyerDolanTechnique.png.
- Niemeyer–Dolan_technique wikiPageWikiLinkText "Niemeyer–Dolan technique".
- Niemeyer–Dolan_technique subject Category:Nanoelectronics.
- Niemeyer–Dolan_technique hypernym Method.
- Niemeyer–Dolan_technique type Software.
- Niemeyer–Dolan_technique comment "The Niemeyer–Dolan technique, also called the Dolan technique or the shadow evaporation technique, is a thin-film lithographic method to create nanometer-sized overlapping structures.This technique uses an evaporation mask that is suspended above the substrate (see figure). The evaporation mask can be formed from two layers of resist. Depending on the evaporation angle, the shadow image of the mask is projected onto different positions on the substrate.".
- Niemeyer–Dolan_technique label "Niemeyer–Dolan technique".
- Niemeyer–Dolan_technique sameAs Q7031672.
- Niemeyer–Dolan_technique sameAs m.0bvlmk.
- Niemeyer–Dolan_technique sameAs Q7031672.
- Niemeyer–Dolan_technique wasDerivedFrom Niemeyer–Dolan_technique?oldid=683767378.
- Niemeyer–Dolan_technique depiction TyNiemeyerDolanTechnique.png.
- Niemeyer–Dolan_technique isPrimaryTopicOf Niemeyer–Dolan_technique.