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- Copper_interconnect abstract "Copper-based chips are semiconductor integrated circuits which use copper for interconnections in the metalization layer, the BEOL. Since copper is a better conductor than aluminium, chips using this technology can have smaller metal components, and use less energy to pass electricity through them. Together, these effects lead to higher-performance processors. They were first introduced by IBM, with assistance from Motorola, in 1997.The transition from aluminium to copper required significant developments in fabrication techniques, including radically different methods for patterning the metal as well as the introduction of barrier metal layers to isolate the silicon from potentially damaging copper atoms.".
- Copper_interconnect wikiPageID "230641".
- Copper_interconnect wikiPageLength "5991".
- Copper_interconnect wikiPageOutDegree "23".
- Copper_interconnect wikiPageRevisionID "699781532".
- Copper_interconnect wikiPageWikiLink Aluminium.
- Copper_interconnect wikiPageWikiLink Back_end_of_line.
- Copper_interconnect wikiPageWikiLink Category:Copper.
- Copper_interconnect wikiPageWikiLink Category:Integrated_circuits.
- Copper_interconnect wikiPageWikiLink Chemical-mechanical_planarization.
- Copper_interconnect wikiPageWikiLink Copper.
- Copper_interconnect wikiPageWikiLink Damascening.
- Copper_interconnect wikiPageWikiLink Deep-level_trap.
- Copper_interconnect wikiPageWikiLink Diffusion.
- Copper_interconnect wikiPageWikiLink Diffusion_barrier.
- Copper_interconnect wikiPageWikiLink Doping_(semiconductor).
- Copper_interconnect wikiPageWikiLink Electrical_resistivity_and_conductivity.
- Copper_interconnect wikiPageWikiLink Electromigration.
- Copper_interconnect wikiPageWikiLink IBM.
- Copper_interconnect wikiPageWikiLink Integrated_circuit.
- Copper_interconnect wikiPageWikiLink Interconnection_(semiconductors).
- Copper_interconnect wikiPageWikiLink Motorola.
- Copper_interconnect wikiPageWikiLink Photolithography.
- Copper_interconnect wikiPageWikiLink Plasma_etching.
- Copper_interconnect wikiPageWikiLink Semiconductor.
- Copper_interconnect wikiPageWikiLink Semiconductor_device_fabrication.
- Copper_interconnect wikiPageWikiLink Silicon.
- Copper_interconnect wikiPageWikiLink Via_(electronics).
- Copper_interconnect wikiPageWikiLinkText "Copper interconnect".
- Copper_interconnect wikiPageWikiLinkText "barrier".
- Copper_interconnect wikiPageWikiLinkText "chip-to-chip interconnect".
- Copper_interconnect wikiPageWikiLinkText "copper damascene".
- Copper_interconnect wikiPageWikiLinkText "copper interconnect".
- Copper_interconnect wikiPageWikiLinkText "copper metal layers".
- Copper_interconnect wikiPageWikiLinkText "copper".
- Copper_interconnect wikiPageWikiLinkText "damascene".
- Copper_interconnect wikiPageUsesTemplate Template:Refimprove.
- Copper_interconnect wikiPageUsesTemplate Template:Reflist.
- Copper_interconnect subject Category:Copper.
- Copper_interconnect subject Category:Integrated_circuits.
- Copper_interconnect hypernym Semiconductor.
- Copper_interconnect type ChemicalCompound.
- Copper_interconnect type Circuit.
- Copper_interconnect type Element.
- Copper_interconnect comment "Copper-based chips are semiconductor integrated circuits which use copper for interconnections in the metalization layer, the BEOL. Since copper is a better conductor than aluminium, chips using this technology can have smaller metal components, and use less energy to pass electricity through them. Together, these effects lead to higher-performance processors.".
- Copper_interconnect label "Copper interconnect".
- Copper_interconnect sameAs Q605757.
- Copper_interconnect sameAs Damascene-Prozess.
- Copper_interconnect sameAs m.01hk7x.
- Copper_interconnect sameAs Q605757.
- Copper_interconnect wasDerivedFrom Copper_interconnect?oldid=699781532.
- Copper_interconnect isPrimaryTopicOf Copper_interconnect.