Matches in DBpedia 2016-04 for { <http://dbpedia.org/resource/Atomic_layer_deposition> ?p ?o }
- Atomic_layer_deposition abstract "Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. ALD is considered a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals, typically called precursors. These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. Through the repeated exposure to separate precursors, a thin film is slowly deposited. ALD is a keyprocess in the fabrication of semiconductor devices, and part of the set of toolsavailable for the synthesis of nanomaterials.".
- Atomic_layer_deposition thumbnail ALD_schematics.jpg?width=300.
- Atomic_layer_deposition wikiPageExternalLink ALD_with_copyright.gif.
- Atomic_layer_deposition wikiPageExternalLink watch?v=9p2wwOTpCCI.
- Atomic_layer_deposition wikiPageID "3607910".
- Atomic_layer_deposition wikiPageLength "39077".
- Atomic_layer_deposition wikiPageOutDegree "76".
- Atomic_layer_deposition wikiPageRevisionID "705516434".
- Atomic_layer_deposition wikiPageWikiLink 45_nanometer.
- Atomic_layer_deposition wikiPageWikiLink ASM_International.
- Atomic_layer_deposition wikiPageWikiLink Aluminium_oxide.
- Atomic_layer_deposition wikiPageWikiLink American_Vacuum_Society.
- Atomic_layer_deposition wikiPageWikiLink Atomic_layer_epitaxy.
- Atomic_layer_deposition wikiPageWikiLink Capacitor.
- Atomic_layer_deposition wikiPageWikiLink Catalysis.
- Atomic_layer_deposition wikiPageWikiLink Category:Chemical_processes.
- Atomic_layer_deposition wikiPageWikiLink Category:Industrial_processes.
- Atomic_layer_deposition wikiPageWikiLink Category:Thin_film_deposition.
- Atomic_layer_deposition wikiPageWikiLink Chemical_process.
- Atomic_layer_deposition wikiPageWikiLink Chemical_vapor_deposition.
- Atomic_layer_deposition wikiPageWikiLink Copper.
- Atomic_layer_deposition wikiPageWikiLink Diffusion_barrier.
- Atomic_layer_deposition wikiPageWikiLink Dynamic_random-access_memory.
- Atomic_layer_deposition wikiPageWikiLink Electroluminescent_display.
- Atomic_layer_deposition wikiPageWikiLink Elimination_reaction.
- Atomic_layer_deposition wikiPageWikiLink Ferroelectric_RAM.
- Atomic_layer_deposition wikiPageWikiLink Finland.
- Atomic_layer_deposition wikiPageWikiLink Hafnium(IV)_oxide.
- Atomic_layer_deposition wikiPageWikiLink Halogen.
- Atomic_layer_deposition wikiPageWikiLink Helsinki_Airport.
- Atomic_layer_deposition wikiPageWikiLink Helsinki_University_of_Technology.
- Atomic_layer_deposition wikiPageWikiLink Heterogeneous_catalysis.
- Atomic_layer_deposition wikiPageWikiLink High-κ_dielectric.
- Atomic_layer_deposition wikiPageWikiLink Hydrogen_bond.
- Atomic_layer_deposition wikiPageWikiLink Immune_system.
- Atomic_layer_deposition wikiPageWikiLink Intel.
- Atomic_layer_deposition wikiPageWikiLink Lewis_acids_and_bases.
- Atomic_layer_deposition wikiPageWikiLink MOSFET.
- Atomic_layer_deposition wikiPageWikiLink Medical_research.
- Atomic_layer_deposition wikiPageWikiLink Metal_gate.
- Atomic_layer_deposition wikiPageWikiLink Moores_law.
- Atomic_layer_deposition wikiPageWikiLink Multiple_discovery.
- Atomic_layer_deposition wikiPageWikiLink Nanomaterials.
- Atomic_layer_deposition wikiPageWikiLink Nitride.
- Atomic_layer_deposition wikiPageWikiLink Nucleophile.
- Atomic_layer_deposition wikiPageWikiLink Permittivity.
- Atomic_layer_deposition wikiPageWikiLink Photovoltaic_system.
- Atomic_layer_deposition wikiPageWikiLink Precursor_(chemistry).
- Atomic_layer_deposition wikiPageWikiLink Protein_adsorption.
- Atomic_layer_deposition wikiPageWikiLink Reaction_mechanism.
- Atomic_layer_deposition wikiPageWikiLink Recording_head.
- Atomic_layer_deposition wikiPageWikiLink Saint_Petersburg_State_Institute_of_Technology.
- Atomic_layer_deposition wikiPageWikiLink Semiconductor.
- Atomic_layer_deposition wikiPageWikiLink Semiconductor_Equipment_and_Materials_International.
- Atomic_layer_deposition wikiPageWikiLink Semiconductor_device_fabrication.
- Atomic_layer_deposition wikiPageWikiLink Silicon_dioxide.
- Atomic_layer_deposition wikiPageWikiLink Soviet_Union.
- Atomic_layer_deposition wikiPageWikiLink Surface_science.
- Atomic_layer_deposition wikiPageWikiLink Tampere_University_of_Technology.
- Atomic_layer_deposition wikiPageWikiLink Tetraethyl_orthosilicate.
- Atomic_layer_deposition wikiPageWikiLink Thin_film.
- Atomic_layer_deposition wikiPageWikiLink Titanium_nitride.
- Atomic_layer_deposition wikiPageWikiLink Trimethylaluminium.
- Atomic_layer_deposition wikiPageWikiLink Tuomo_Suntola.
- Atomic_layer_deposition wikiPageWikiLink University_of_Helsinki.
- Atomic_layer_deposition wikiPageWikiLink Wiktionary:biocompatible.
- Atomic_layer_deposition wikiPageWikiLink Wiktionary:nanoporous.
- Atomic_layer_deposition wikiPageWikiLink Wiktionary:precursor.
- Atomic_layer_deposition wikiPageWikiLink Work_function.
- Atomic_layer_deposition wikiPageWikiLink Zirconium_dioxide.
- Atomic_layer_deposition wikiPageWikiLink File:ALD_schematics.jpg.
- Atomic_layer_deposition wikiPageWikiLink File:Al2O3_Reaction_Mechanism_for_ALD.png.
- Atomic_layer_deposition wikiPageWikiLink File:SiO2_Reaction_Mechanism.png.
- Atomic_layer_deposition wikiPageWikiLinkText "ALD".
- Atomic_layer_deposition wikiPageWikiLinkText "Atomic layer deposition (ALD)".
- Atomic_layer_deposition wikiPageWikiLinkText "Atomic layer deposition".
- Atomic_layer_deposition wikiPageWikiLinkText "atomic layer deposition (ALD)".
- Atomic_layer_deposition wikiPageWikiLinkText "atomic layer deposition".
- Atomic_layer_deposition wikiPageWikiLinkText "transition metal nitrides".
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- Atomic_layer_deposition wikiPageUsesTemplate Template:Refbegin.
- Atomic_layer_deposition wikiPageUsesTemplate Template:Refend.
- Atomic_layer_deposition wikiPageUsesTemplate Template:Reflist.
- Atomic_layer_deposition wikiPageUsesTemplate Template:Sub.
- Atomic_layer_deposition wikiPageUsesTemplate Template:Sup.
- Atomic_layer_deposition wikiPageUsesTemplate Template:Z148.
- Atomic_layer_deposition subject Category:Chemical_processes.
- Atomic_layer_deposition subject Category:Industrial_processes.
- Atomic_layer_deposition subject Category:Thin_film_deposition.
- Atomic_layer_deposition hypernym Technique.
- Atomic_layer_deposition type Film.
- Atomic_layer_deposition type TopicalConcept.
- Atomic_layer_deposition type Coating.
- Atomic_layer_deposition type Film.
- Atomic_layer_deposition type Process.
- Atomic_layer_deposition type Redirect.
- Atomic_layer_deposition comment "Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. ALD is considered a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals, typically called precursors. These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. Through the repeated exposure to separate precursors, a thin film is slowly deposited.".
- Atomic_layer_deposition label "Atomic layer deposition".
- Atomic_layer_deposition sameAs Q757625.
- Atomic_layer_deposition sameAs Atomlagenabscheidung.