Matches in DBpedia 2016-04 for { ?s ?p "Ex. 5: A trench structure consisting of various films and complex profile. The Poly-Si film was measured on a blanket area of the sample and its n and k spectra were determined based on the Forouhi-Bloomer Dispersion Equations. A fixed table of values for the n and k spectra of the SiO2 and Si3N4 films was utilized. With the n and k spectra of these films at hand, and utilizing Rigorous Coupled Wave Analysis , film thicknesses, various depths inside the trench, and CDs are then determined."@en }
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- Refractive_index_and_extinction_coefficient_of_thin_film_materials footer "Ex. 5: A trench structure consisting of various films and complex profile. The Poly-Si film was measured on a blanket area of the sample and its n and k spectra were determined based on the Forouhi-Bloomer Dispersion Equations. A fixed table of values for the n and k spectra of the SiO2 and Si3N4 films was utilized. With the n and k spectra of these films at hand, and utilizing Rigorous Coupled Wave Analysis , film thicknesses, various depths inside the trench, and CDs are then determined.".