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- Ion_beam_deposition abstract "Ion Beam Deposition (IBD) is a process of applying materials to a target through the application of an ion beam.An ion beam deposition apparatus typically consists of an ion source, ion optics and the deposition target. Optionally a mass analyzer can be incorporated.In the ion source source materials in the form of a gas, an evaporated solid, or a solution (liquid) are ionized. For atomic ion IBD, electron ionization, field ionization (Penning ion source) or cathodic arc sources are employed. Cathodic arc sources are used particularly for carbon ion deposition. Molecular ion beam deposition employs electrospray ionization or MALDI sources.The ions are then accelerated, focused or deflected using high voltages or magnetic fields. Optional deceleration at the substrate can be employed to define the deposition energy. This energy usually ranges from a few eV up to a few keV. At low energy molecular ion beams are deposited intact (soft landing), while at a high deposition energy molecular ions fragment and atomic ions penetrate further into the material, a process known as ion implantation.Ion optics (such as radio frequency quadrupoles) can be mass selective. In IBD they are used to select a single, or a range of ion species for deposition in order to avoid contamination. For organic materials in particular, this process is often monitored by a mass spectrometer.The ion beam current, which is quantitative measure for the deposited amount of material, can be monitored during the deposition process. Switching of the selected mass range can be used to define a stoichiometry.".
- Ion_beam_deposition thumbnail Ion_implanter_schematic.png?width=300.
- Ion_beam_deposition wikiPageID "1592850".
- Ion_beam_deposition wikiPageLength "1971".
- Ion_beam_deposition wikiPageOutDegree "20".
- Ion_beam_deposition wikiPageRevisionID "622108193".
- Ion_beam_deposition wikiPageWikiLink Carbon.
- Ion_beam_deposition wikiPageWikiLink Category:Thin_film_deposition.
- Ion_beam_deposition wikiPageWikiLink Cathodic_Arc_Deposition.
- Ion_beam_deposition wikiPageWikiLink Cathodic_arc.
- Ion_beam_deposition wikiPageWikiLink Cathodic_arc_deposition.
- Ion_beam_deposition wikiPageWikiLink Electron_beam-induced_deposition.
- Ion_beam_deposition wikiPageWikiLink Electron_ionization.
- Ion_beam_deposition wikiPageWikiLink Electronvolt.
- Ion_beam_deposition wikiPageWikiLink Electrospray_ionization.
- Ion_beam_deposition wikiPageWikiLink Ion_beam.
- Ion_beam_deposition wikiPageWikiLink Ion_beam-assisted_deposition.
- Ion_beam_deposition wikiPageWikiLink Ion_beam_assisted_deposition.
- Ion_beam_deposition wikiPageWikiLink Ion_beam_induced_deposition.
- Ion_beam_deposition wikiPageWikiLink Ion_implantation.
- Ion_beam_deposition wikiPageWikiLink Ion_source.
- Ion_beam_deposition wikiPageWikiLink MALDI.
- Ion_beam_deposition wikiPageWikiLink Mass_spectrometer.
- Ion_beam_deposition wikiPageWikiLink Mass_spectrometry.
- Ion_beam_deposition wikiPageWikiLink ionization.
- Ion_beam_deposition wikiPageWikiLink Penning_ion_source.
- Ion_beam_deposition wikiPageWikiLink Sputter_deposition.
- Ion_beam_deposition wikiPageWikiLink Stoichiometry.
- Ion_beam_deposition wikiPageWikiLink File:Ion_implanter_schematic.png.
- Ion_beam_deposition wikiPageWikiLinkText "Ion beam deposition".
- Ion_beam_deposition wikiPageWikiLinkText "cathodic arc deposition".
- Ion_beam_deposition wikiPageWikiLinkText "ion beam assisted deposition".
- Ion_beam_deposition wikiPageWikiLinkText "ion beam deposition".
- Ion_beam_deposition wikiPageWikiLinkText "ion-beam induced deposition".
- Ion_beam_deposition hasPhotoCollection Ion_beam_deposition.
- Ion_beam_deposition subject Category:Thin_film_deposition.
- Ion_beam_deposition hypernym Process.
- Ion_beam_deposition type Election.
- Ion_beam_deposition type Film.
- Ion_beam_deposition type Coating.
- Ion_beam_deposition type Film.
- Ion_beam_deposition type Process.
- Ion_beam_deposition comment "Ion Beam Deposition (IBD) is a process of applying materials to a target through the application of an ion beam.An ion beam deposition apparatus typically consists of an ion source, ion optics and the deposition target. Optionally a mass analyzer can be incorporated.In the ion source source materials in the form of a gas, an evaporated solid, or a solution (liquid) are ionized. For atomic ion IBD, electron ionization, field ionization (Penning ion source) or cathodic arc sources are employed.".
- Ion_beam_deposition label "Ion beam deposition".
- Ion_beam_deposition sameAs 이온_빔_퇴적물.
- Ion_beam_deposition sameAs m.05f236.
- Ion_beam_deposition sameAs Q17125820.
- Ion_beam_deposition sameAs Q17125820.
- Ion_beam_deposition wasDerivedFrom Ion_beam_deposition?oldid=622108193.
- Ion_beam_deposition depiction Ion_implanter_schematic.png.
- Ion_beam_deposition isPrimaryTopicOf Ion_beam_deposition.