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- Etch_pit_density wikiPageID "2927563".
- Etch_pit_density wikiPageLength "1312".
- Etch_pit_density wikiPageOutDegree "18".
- Etch_pit_density wikiPageRevisionID "546990058".
- Etch_pit_density wikiPageWikiLink ASTM.
- Etch_pit_density wikiPageWikiLink ASTM_International.
- Etch_pit_density wikiPageWikiLink Category:Semiconductors.
- Etch_pit_density wikiPageWikiLink Crucible.
- Etch_pit_density wikiPageWikiLink Crystal.
- Etch_pit_density wikiPageWikiLink DIN.
- Etch_pit_density wikiPageWikiLink Density.
- Etch_pit_density wikiPageWikiLink Deutsches_Institut_für_Normung.
- Etch_pit_density wikiPageWikiLink Dislocation.
- Etch_pit_density wikiPageWikiLink Etching_(microfabrication).
- Etch_pit_density wikiPageWikiLink GaAs.
- Etch_pit_density wikiPageWikiLink Gallium_arsenide.
- Etch_pit_density wikiPageWikiLink Microscopy.
- Etch_pit_density wikiPageWikiLink Potassium_hydroxide.
- Etch_pit_density wikiPageWikiLink Rate_(mathematics).
- Etch_pit_density wikiPageWikiLink Semiconductor.
- Etch_pit_density wikiPageWikiLink Semiconductor_detector.
- Etch_pit_density wikiPageWikiLink Silicon.
- Etch_pit_density wikiPageWikiLink Wafer_(electronics).
- Etch_pit_density wikiPageWikiLink Wikt:pit.
- Etch_pit_density wikiPageWikiLink Zirconium.
- Etch_pit_density wikiPageWikiLinkText "Etch pit density".
- Etch_pit_density wikiPageWikiLinkText "etch pit".
- Etch_pit_density hasPhotoCollection Etch_pit_density.
- Etch_pit_density wikiPageUsesTemplate Template:Measurement-stub.
- Etch_pit_density wikiPageUsesTemplate Template:Unreferenced_stub.
- Etch_pit_density subject Category:Semiconductors.
- Etch_pit_density hypernym Measure.
- Etch_pit_density type Article.
- Etch_pit_density type Work.
- Etch_pit_density type Article.
- Etch_pit_density type Physic.
- Etch_pit_density type Semiconductor.
- Etch_pit_density comment "The etch pit density (EPD) is a measure for the quality of semiconductor wafers. An etch solution is applied on the surface of the wafer where the etch rate is increased at dislocations of the crystal resulting in pits. For GaAs one uses typically molten KOH at 450 degrees Celsius for about 40 minutes in a zirconium crucible. The density of the pits can be determined by optical contrast microscopy.".
- Etch_pit_density label "Etch pit density".
- Etch_pit_density sameAs Versetzungsdichte.
- Etch_pit_density sameAs 에치_피트_밀도.
- Etch_pit_density sameAs m.08d6d4.
- Etch_pit_density sameAs Q2518122.
- Etch_pit_density sameAs Q2518122.
- Etch_pit_density wasDerivedFrom Etch_pit_density?oldid=546990058.
- Etch_pit_density isPrimaryTopicOf Etch_pit_density.