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- Chalcogenide_chemical_vapour_deposition abstract "Chalcogenide chemical vapour deposition is a proposed technology for depositing thin films of chalcogenides, i.e. materials derived from sulfides, selenides, and tellurides. Conventional CVD can be used to deposit films of most metals, many non-metallic elements (notably silicon) as well as a large number of compounds including carbides, nitrides, oxides. CVD can be used to synthesize chalcogenide glasses.".
- Chalcogenide_chemical_vapour_deposition thumbnail GeS_CVD_setup.png?width=300.
- Chalcogenide_chemical_vapour_deposition wikiPageID "38430890".
- Chalcogenide_chemical_vapour_deposition wikiPageLength "5008".
- Chalcogenide_chemical_vapour_deposition wikiPageOutDegree "11".
- Chalcogenide_chemical_vapour_deposition wikiPageRevisionID "627744116".
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink Category:Semiconductor_device_fabrication.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink Chalcogenide.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink Germanium_disulfide.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink Hydrogen_sulfide.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink Hydrogen_sulphide.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink Selenide.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink Silicon.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink Sulfide.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink Telluride_(chemistry).
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink File:GST_CVD_setup.tif.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLink File:GeS_CVD_setup.png.
- Chalcogenide_chemical_vapour_deposition wikiPageWikiLinkText "chalcogenide chemical vapour deposition".
- Chalcogenide_chemical_vapour_deposition hasPhotoCollection Chalcogenide_chemical_vapour_deposition.
- Chalcogenide_chemical_vapour_deposition subject Category:Semiconductor_device_fabrication.
- Chalcogenide_chemical_vapour_deposition hypernym Technology.
- Chalcogenide_chemical_vapour_deposition type Company.
- Chalcogenide_chemical_vapour_deposition type Process.
- Chalcogenide_chemical_vapour_deposition type Semiconductor.
- Chalcogenide_chemical_vapour_deposition comment "Chalcogenide chemical vapour deposition is a proposed technology for depositing thin films of chalcogenides, i.e. materials derived from sulfides, selenides, and tellurides. Conventional CVD can be used to deposit films of most metals, many non-metallic elements (notably silicon) as well as a large number of compounds including carbides, nitrides, oxides. CVD can be used to synthesize chalcogenide glasses.".
- Chalcogenide_chemical_vapour_deposition label "Chalcogenide chemical vapour deposition".
- Chalcogenide_chemical_vapour_deposition sameAs m.0qrz_l7.
- Chalcogenide_chemical_vapour_deposition sameAs Q5068627.
- Chalcogenide_chemical_vapour_deposition sameAs Q5068627.
- Chalcogenide_chemical_vapour_deposition wasDerivedFrom Chalcogenide_chemical_vapour_deposition?oldid=627744116.
- Chalcogenide_chemical_vapour_deposition depiction GeS_CVD_setup.png.
- Chalcogenide_chemical_vapour_deposition isPrimaryTopicOf Chalcogenide_chemical_vapour_deposition.