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- Nanoimprint_lithography abstract "Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.".
- Nanoimprint_lithography wikiPageExternalLink molecularimprints.com.
- Nanoimprint_lithography wikiPageExternalLink nanonex.com.
- Nanoimprint_lithography wikiPageExternalLink 7162606.stm.
- Nanoimprint_lithography wikiPageExternalLink nilt.com.
- Nanoimprint_lithography wikiPageExternalLink people.html.
- Nanoimprint_lithography wikiPageExternalLink www.microresist.com.
- Nanoimprint_lithography wikiPageExternalLink ?Start:NanoImprint-Animation.
- Nanoimprint_lithography wikiPageExternalLink www.obducat.com.
- Nanoimprint_lithography wikiPageExternalLink choubio.html.
- Nanoimprint_lithography wikiPageID "2669179".
- Nanoimprint_lithography wikiPageRevisionID "604194984".
- Nanoimprint_lithography hasPhotoCollection Nanoimprint_lithography.
- Nanoimprint_lithography subject Category:American_inventions.
- Nanoimprint_lithography subject Category:Lithography_(microfabrication).
- Nanoimprint_lithography type Ability105616246.
- Nanoimprint_lithography type Abstraction100002137.
- Nanoimprint_lithography type AmericanInventions.
- Nanoimprint_lithography type Cognition100023271.
- Nanoimprint_lithography type Creativity105624700.
- Nanoimprint_lithography type Invention105633385.
- Nanoimprint_lithography type PsychologicalFeature100023100.
- Nanoimprint_lithography comment "Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.".
- Nanoimprint_lithography label "Nanoimprint lithography".
- Nanoimprint_lithography label "Nanoprägelithografie".
- Nanoimprint_lithography label "Нанопечатная литография".
- Nanoimprint_lithography sameAs Nanoprägelithografie.
- Nanoimprint_lithography sameAs m.07wqj7.
- Nanoimprint_lithography sameAs Q1540138.
- Nanoimprint_lithography sameAs Q1540138.
- Nanoimprint_lithography sameAs Nanoimprint_lithography.
- Nanoimprint_lithography wasDerivedFrom Nanoimprint_lithography?oldid=604194984.
- Nanoimprint_lithography isPrimaryTopicOf Nanoimprint_lithography.